Deep etch lithography at LURE-D.C.I. storage ring

S. Megtert (1) , A. Labèque (1) , Liu Zewen (1) , H. Dexpert (1) , R. Comès (1) , F. Rousseaux (2) , M. Ravet (2) , H. Launois (2) , S. Ballandras (3) , W. Daniau (3) , Skandar Basrour (3) , M. Rouillay (3) , P. Blind (4) , D. Hauden (4)

1 LURE - Laboratoire pour l'utilisation du rayonnement électromagnétique
2 L2M - Laboratoire de Microstructures et de Microélectronique
3 Laboratoire de Physique et Métrologie des Oscillateurs
4 CETEHOR [Département technique du Comité FRANCECLAT]

LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to introduce this new technology at LURE facilities. In this paper are described the different steps of the deep etch lithography process including mask realization and first pseudo-tridimensional resist structures are shown.

Mots clés: LURE-DCI-storage-ring; deep-etch-lithography; micro-fabrication; mass-production

Domaines: Articles anciens

S. Megtert, A. Labèque, Liu Zewen, H. Dexpert, R. Comès, et al.. Deep etch lithography at LURE-D.C.I. storage ring. Journal de Physique IV Proceedings, 1994, 04 (C9), pp.C9-269-C9-272. ⟨10.1051/jp4:1994947⟩. ⟨jpa-00253508⟩