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Structural and dielectric characterization of perovskite oxide and oxynitride lanthanum titanium films deposited by reactive sputtering deposition

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https://hal-univ-rennes1.archives-ouvertes.fr/hal-00869768
Contributor : Ratiba Benzerga Connect in order to contact the contributor
Submitted on : Friday, October 4, 2013 - 10:07:37 AM
Last modification on : Wednesday, April 27, 2022 - 3:55:27 AM

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  • HAL Id : hal-00869768, version 1

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Claire Le Paven-Thivet, Yu Lu, Hung Nguyen, Ratiba Benzerga, Laurent Le Gendre, et al.. Structural and dielectric characterization of perovskite oxide and oxynitride lanthanum titanium films deposited by reactive sputtering deposition. 19th International Vacuum Congress (IVC-19), Sep 2013, Paris, France. ⟨hal-00869768⟩

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